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Laser damage studies on MgF2 thin films

TitoloLaser damage studies on MgF2 thin films
Tipo di pubblicazioneArticolo su Rivista peer-reviewed
Anno di Pubblicazione2001
AutoriProtopapa, Maria Lucia, de Tomasi F., Perrone M.R., Piegari A., Masetti E., Ristau D., Quesnel E., and Duparre A.
RivistaJournal of Vacuum Science and Technology, Part A: Vacuum, Surfaces and Films
Volume19
Paginazione681-688
ISSN07342101
Parole chiaveDeposition, Electron beam evaporation, Excimer lasers, Laser damage, Magnesium compounds, Photoacoustic beam deflection, Photoacoustic effect, Scanning electron microscopy, Substrates, Thin films
Abstract

A 248 nm KrF excimer laser was used to study the damage on MgF2 thin films deposited on fused silica and CaF2 substrates. The photoacoustic beam deflection technique was used to obtain information on the radiation-film interaction processes, which can be used to validate the damage processes revealed by scanning electron microscopy (SEM). A large intrinsic tensile stress resulted from the mismatch between the thermal expansion coefficient of a fused silica substrate and the MgF2 film.

Note

cited By 13

URLhttps://www.scopus.com/inward/record.uri?eid=2-s2.0-0035273638&doi=10.1116%2f1.1347049&partnerID=40&md5=9987301b9c39b0a0990b95a82b0fab7d
DOI10.1116/1.1347049
Citation KeyProtopapa2001681