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Polymer to polymer to polymer pattern transfer: Multiple molding for 100 nm scale lithography

TitoloPolymer to polymer to polymer pattern transfer: Multiple molding for 100 nm scale lithography
Tipo di pubblicazioneArticolo su Rivista peer-reviewed
Anno di Pubblicazione2006
AutoriMele, E., Di Benedetto Francesca, Persano L., Cingolani R., and Pisignano D.
RivistaJournal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Volume24
Paginazione807-812
ISSN10711023
Parole chiaveElastomers, Lithography, Micromachining, Nanoimprinting lithographies, Pattern transfer, Plastics molding, Polymers, Replica molding, Ultraviolet radiation
Abstract

We demonstrate a multiple molding procedure based on the combination of replica molding, in situ patterning of an ultraviolet curable epoxy resist, micromachining by elastomeric elements, and nanoimprinting lithography. The pattern, with features down to the 100 nm scale, is sequentially transferred to several different polymers, allowing one to realize high-resolution organic molds for imprinting compounds of lower glass-transition temperature. The intimate integration of soft and nanoimprinting lithographies enables a combined, multistep mechanical patterning, which can be very useful for a great range of applications for molecular lithography and devices. © 2006 American Vacuum Society.

Note

cited By 10

URLhttps://www.scopus.com/inward/record.uri?eid=2-s2.0-33645502869&doi=10.1116%2f1.2184327&partnerID=40&md5=aea247b1d3ae3dba505e9e365de38eb0
DOI10.1116/1.2184327
Citation KeyMele2006807