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  3. Laser-induced damage thresholds of SiO2 films grown with different assistance parameters: a comparative study performed by the photoacoustic mirage technique

Laser-induced damage thresholds of SiO2 films grown with different assistance parameters: a comparative study performed by the photoacoustic mirage technique

TitoloLaser-induced damage thresholds of SiO2 films grown with different assistance parameters: a comparative study performed by the photoacoustic mirage technique
Tipo di pubblicazionePresentazione a Congresso
Anno di Pubblicazione1998
AutoriAlvisi, Marco, De Nunzio G., Perrone M.R., Rizzo Antonella, Scaglione S., and Vasanelli L.
Conference NameConference on Lasers and Electro-Optics Europe - Technical Digest
EditoreIEEE, Piscataway, NJ, United States
Conference LocationGlasgow, Scotland
Parole chiaveAcoustooptical effects, Coatings, Fabrication, Film growth, Fused silica, Helium neon lasers, Ion beams, Laser damage, Light transmission, Mirrors, Photoacoustic mirage technique, Pulsed laser applications, Refractive index, Thin films
Abstract

The dual ion beam sputtering technique has been used to grow SiO2 thin films on fused silica substrates. The role of some deposition parameters on the coating laser-induced damage threshold (LIDT) has been investigated. Results indicate that a proper choice of the assisting-ion-beam parameters allows to optimize the coating quality and to increase its damage threshold.
URLhttps://www.scopus.com/inward/record.uri?eid=2-s2.0-0031625338&partnerID=40&md5=6a26049a4c5f7560d0b9b53f1546f137
Citation KeyAlvisi1998311