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Surface and interface morphology of thin oxide films investigated by X-ray reflectivity and atomic force microscopy

TitoloSurface and interface morphology of thin oxide films investigated by X-ray reflectivity and atomic force microscopy
Tipo di pubblicazioneArticolo su Rivista peer-reviewed
Anno di Pubblicazione1998
AutoriAlvisi, Marco, Leo G., Rizzo Antonella, Tapfer Leander, and Vasanelli L.
RivistaSurface and Coatings Technology
Volume100-101
Paginazione76-79
ISSN02578972
Parole chiaveAtomic force microscopy, Dual ion beam sputtering technique, Hafnium compounds, Interfaces (materials), Ion beams, Morphology, Optical films, Silica, Sputter deposition, Substrates, Surface roughness, Thin films, X ray reflectivity, X ray scattering, Zirconia
Abstract

In this work, we investigate in details the air/film and film/substrate interface morphology of single HfO2, SiO2 and ZrO2 films by means of X-ray reflectivity and atomic force microscopy measurements. The films were deposited on silicon substrate by dual ion beam sputtering technique. The roughness obtained from the X-ray scattering experiments were compared with the atomic force microscopy data. © 1998 Published by Elsevier Science S.A.

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cited By 1

URLhttps://www.scopus.com/inward/record.uri?eid=2-s2.0-0032021648&partnerID=40&md5=7c60450f9db149f3ba817fa0943509c0
Citation KeyAlvisi199876