| Titolo | High-reflectivity HfO2/SiO2 ultraviolet mirrors |
|---|---|
| Tipo di pubblicazione | Articolo su Rivista peer-reviewed |
| Anno di Pubblicazione | 2002 |
| Autori | Torchio, P., Gatto A., Alvisi Marco, Albrand G., Kaiser N., and Amra C. |
| Rivista | Applied Optics |
| Volume | 41 |
| Paginazione | 3256-3261 |
| ISSN | 00036935 |
| Abstract | High-reflectivity dense multilayer coatings were produced for the ultraviolet spectral region. Thin-film single layers and UV mirrors were deposited by ion plating and plasma ion-assisted deposition highenergetic technologies. Optical characterizations of HfO2 and SiO2 single layers are made. The optical constants obtained for these two materials are presented. HfO2 and SiO2 mirrors with a reflectance of ∼99% near 250 nm are reported. © 2002 Optical Society of America. |
| Note | cited By 68 |
| URL | https://www.scopus.com/inward/record.uri?eid=2-s2.0-0036603444&partnerID=40&md5=94c424c5dfaf21f3f6fe3b8f9e1005c2 |
| Citation Key | Torchio20023256 |
