Multiwalled carbon nanotube (MWCNT) films have been deposited by using plasma enhanced chemical vapor deposition (PECVD) system onto Cr-Au patterned alumina substrates for N O2 and N H3 gas sensing applications, at operating temperature of 200 °C. Nanoclusters of different MWCNT-growth catalysts (Fe and Co) have been predeposited onto substrates to promote the growth of the carbon nanotube films with different structural properties. It is demonstrated that the gas sensitivity of the MWCNT films depends on catalyst used for their growth with highest gas sensitivity achieved for Co-grown MWCNT films. The chemiresistor gas response is attributed to the p -type conductivity in semiconducting MWCNTs and the electrical charge transfer is found to be the major sensing mechanism. The results obtained demonstrate that the MWCNT-based sensors exhibit high gas sensitivity, fast response and reversibility, good repeatability and reproducibility, and sub-ppm range detection limit with the gas sensing properties of the MWCNT films tailored by catalyst employed in the PECVD growth process. © 2007 American Institute of Physics.

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