Sorry, you need to enable JavaScript to visit this website.

Tungsten trioxide (WO3) sputtered thin films for a NOx gas sensor

TitoloTungsten trioxide (WO3) sputtered thin films for a NOx gas sensor
Tipo di pubblicazioneArticolo su Rivista peer-reviewed
Anno di Pubblicazione1998
AutoriPenza, Michele, Tagliente M.A., Mirenghi L., Gerardi C., Martucci C., and Cassano Gennaro
RivistaSensors and Actuators, B: Chemical
Volume50
Paginazione9-18
ISSN09254005
Parole chiaveChemical sensors, Electric current measurement, Electric resistance, Film growth, glass, Nitrogen oxides, Secondary ion mass spectrometry, Sputter deposition, Substrates, Thin films, Tungsten compounds, Tungsten trioxide sputtered thin films, X ray diffraction analysis, X ray photoelectron spectroscopy
Abstract

WO3 thin films have been deposited by reactive rf sputtering onto low-cost glass substrates as gas sensitive coatings. The properties of the grown films have been investigated by X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS), secondary ion mass spectrometry (SIMS) in order to characterize their structure, composition, surface chemistry. The d.c. electrical response to different gases of the WO3 thin films has been measured in the temperature range from 100 to 400°C showing an increase of electrical resistance with a good sensitivity towards NOx gas at 250°C. WO3 thin films oppositely detect also NH3, H2, H2S, SO2 gases by decreasing the electrical resistance and are practically insensitive to interfering gases like CO, CH4 in the same temperature range. The sensing characteristics of the NOx gas detector based on tungsten trioxide (WO3) thin films are reported. © 1998 Elsevier Science S.A. All rights reserved.

Note

cited By 125

URLhttps://www.scopus.com/inward/record.uri?eid=2-s2.0-0032119866&partnerID=40&md5=8e99451ba3b620e3f4cca5abdc79fe58
Citation KeyPenza19989