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Properties of (In,Ga)N/GaN quantum wells grown by plasma-assisted molecular beam epitaxy

TitleProperties of (In,Ga)N/GaN quantum wells grown by plasma-assisted molecular beam epitaxy
Publication TypeArticolo su Rivista peer-reviewed
Year of Publication2002
AuthorsBrandt, O., Waltereit P., Dhar S., Jahn U., Sun Y.J., Trampert A., Ploog K.H., Tagliente M.A., and Tapfer Leander
JournalJournal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Volume20
Pagination1626-1639
ISSN10711023
KeywordsCathodoluminescence, Composition effects, Electric field effects, Epitaxial growth, Gallium nitride, Indium nitride, Metal stable growth, Molecular beam epitaxy, Photoluminescence, Plasma applications, Plasma assisted molecular beam epitaxy, Secondary ion mass spectrometry, Semiconducting indium compounds, Semiconductor quantum wells, Synthesis (chemical), Transition energy, Transmission electron microscopy
Abstract

(In,GaN)/GaN MQWs were synthesized by plasma-assisted MBE. The structural properties of these MQWs were investigated with particular emphasis on an accurate determination of their actual structural parameters. In surface segregation affected the optical properties of the samples.

Notes

cited By 10; Conference of Proceedings of the 29th Conference on the Physics and Chemistry of Semiconductor Interfaces ; Conference Date: 6 January 2002 Through 10 January 2002; Conference Code:59676

URLhttps://www.scopus.com/inward/record.uri?eid=2-s2.0-0035982597&doi=10.1116%2f1.1491540&partnerID=40&md5=1bdb353ad63136e8015e34578c4208f9
DOI10.1116/1.1491540
Citation KeyBrandt20021626