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Improving the gravure printed PEDOT:PSS electrode by gravure printing DMSO post-treatment

TitleImproving the gravure printed PEDOT:PSS electrode by gravure printing DMSO post-treatment
Publication TypeArticolo su Rivista peer-reviewed
Year of Publication2018
AuthorsSico, Giuliano, Montanino M., De Girolamo Del Mauro Anna, and Minarini Carla
JournalJournal of Materials Science: Materials in Electronics
Volume29
Pagination11730-11737
ISSN09574522
Keywords4-ethylenedioxythiophene):poly(styrenesulfonate), Conducting polymers, Cost effectiveness, Electrodes, Flexible electronics, Graphic methods, Gravure printing, Industrial production, Low conductivity, Mass production, Offset printing, Plastic electronics, Poly(3, Polymeric chain, Printed electrodes
Abstract

The poly(3,4ethylenedioxythiophene):poly(styrenesulfonate) (PEDOT:PSS) is one of the most attractive conducting polymers proposed as electrode for flexible electronics. Promising methods for enhancing its low conductivity, main limit for its use, are based on post-treatment. However, most of them are not suitable for mass production. In this study, the gravure printing technique was tried for the post-treatment of the PEDOT layer using dimethylsulfoxide (DMSO), as practical, safe and cost effective process for improving the printed electrode. An increase of the conductivity of the printed PEDOT:PSS layer was found and attributed to the rearrangement of the polymeric chains that leads to the formation of PEDOT-rich regions improving the conducting pathways. In addition, smoother film surface and improved stability to the humidity were obtained, representing further advantages for its employment in plastic electronics. Therefore, the feasibility and the efficacy of the DMSO post-treatment of the PEDOT:PSS films by gravure printing were demonstrated, showing the way for the low cost all in-line industrial production of large area PEDOT:PSS electrodes. © 2018, Springer Science+Business Media, LLC, part of Springer Nature.

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URLhttps://www.scopus.com/inward/record.uri?eid=2-s2.0-85046906875&doi=10.1007%2fs10854-018-9271-1&partnerID=40&md5=8471e0c042a1508b9ad9635ef4dc04da
DOI10.1007/s10854-018-9271-1
Citation KeySico201811730