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Nanostructuring polymers by soft lithography templates realized via ion sputtering

TitleNanostructuring polymers by soft lithography templates realized via ion sputtering
Publication TypeArticolo su Rivista peer-reviewed
Year of Publication2005
AuthorsMele, E., Di Benedetto Francesca, Cingolani R., Pisignano D., Toma A., De Mongeot F.B., Buzio R., Boragno C., Firpo G., Mussi V., and Valbusa U.
JournalNanotechnology
Volume16
Pagination2714-2717
ISSN09574484
KeywordsCapillary force lithography, Ion beams, Ion sputtering, Lithography, Nanostructured materials, Organic polymers, Organic-based devices, Soft lithography
Abstract

We demonstrate that a combination of ion sputtering and soft lithography is an alternative and effective way of nanostructuring soft matter. We create self-organized nanoscale structures on a glass template by irradiating the surface with a defocused, low energy Ar ion beam. Capillary force lithography is then used to transfer the pattern, exploiting the glass transition of polymeric layers. In particular, we demonstrate the pattern transfer of a periodic 150 nm ripple structure onto an organic compound. This new, unconventional combination is then a low-cost strategy that opens the way to a variety of applications in the field of organic-based devices. © 2005 IOP Publishing Ltd.

Notes

cited By 4

URLhttps://www.scopus.com/inward/record.uri?eid=2-s2.0-26444437198&doi=10.1088%2f0957-4484%2f16%2f11%2f041&partnerID=40&md5=26cd89a75704335a75f979c974d4a575
DOI10.1088/0957-4484/16/11/041
Citation KeyMele20052714