Title | Nanostructuring polymers by soft lithography templates realized via ion sputtering |
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Publication Type | Articolo su Rivista peer-reviewed |
Year of Publication | 2005 |
Authors | Mele, E., Di Benedetto Francesca, Cingolani R., Pisignano D., Toma A., De Mongeot F.B., Buzio R., Boragno C., Firpo G., Mussi V., and Valbusa U. |
Journal | Nanotechnology |
Volume | 16 |
Pagination | 2714-2717 |
ISSN | 09574484 |
Keywords | Capillary force lithography, Ion beams, Ion sputtering, Lithography, Nanostructured materials, Organic polymers, Organic-based devices, Soft lithography |
Abstract | We demonstrate that a combination of ion sputtering and soft lithography is an alternative and effective way of nanostructuring soft matter. We create self-organized nanoscale structures on a glass template by irradiating the surface with a defocused, low energy Ar ion beam. Capillary force lithography is then used to transfer the pattern, exploiting the glass transition of polymeric layers. In particular, we demonstrate the pattern transfer of a periodic 150 nm ripple structure onto an organic compound. This new, unconventional combination is then a low-cost strategy that opens the way to a variety of applications in the field of organic-based devices. © 2005 IOP Publishing Ltd. |
Notes | cited By 4 |
URL | https://www.scopus.com/inward/record.uri?eid=2-s2.0-26444437198&doi=10.1088%2f0957-4484%2f16%2f11%2f041&partnerID=40&md5=26cd89a75704335a75f979c974d4a575 |
DOI | 10.1088/0957-4484/16/11/041 |
Citation Key | Mele20052714 |