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Laser damage resistance of thin films for ultraviolet optical components

TitleLaser damage resistance of thin films for ultraviolet optical components
Publication TypeArticolo su Rivista peer-reviewed
Year of Publication2000
AuthorsPiegari, A., Perrone M.R., and Protopapa M.R.
JournalProceedings of SPIE - The International Society for Optical Engineering
Volume4430
Pagination869-881
ISSN0277786X
KeywordsDeposition, Electric fields, Excimer lasers, High power lasers, Laser cavity mirrors, Laser damage, Laser radiation, Mirrors, Multilayers, Optical coatings, Optical components, Ultraviolet coatings
Abstract

The laser induced damage in optical coatings plays a limiting role in the laser reliability. Either the laser cavity mirrors and the optical components employed outside the cavity are often damaged by the laser radiation delivered by high power lasers. Their resistance becomes more critical at shorter wavelengths, therefore the research is focused on the ultraviolet region where excimer lasers are finding many applications. Laser damage studies were performed at 248 nm (KrF laser) and 308 nm (XeCl laser) on MgF2, HfO2 and SiO2 single films and multilayer coatings. Results about the dependence of damage threshold on both the deposition technique and the standing-wave electric field profile inside the coating, are reported. © 2001 SPIE.

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URLhttps://www.scopus.com/inward/record.uri?eid=2-s2.0-0034426168&doi=10.1117%2f12.432820&partnerID=40&md5=57203fb42f7c009fca510ab62395f9c4
DOI10.1117/12.432820
Citation KeyPiegari2000869