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Phase-unifying mirrors for high-power XeF excimer lasers

TitlePhase-unifying mirrors for high-power XeF excimer lasers
Publication TypeArticolo su Rivista peer-reviewed
Year of Publication2003
Authorsde Tomasi, F., Aghamkar P., Perrone M.R., Protopapa Maria Lucia, Piegari A., Andre' B., and Ravel G.
JournalApplied Physics Letters
Volume82
Pagination1809-1811
ISSN00036951
KeywordsCharge coupled devices, Excimer lasers, Fourier transforms, Hafnium compounds, Laser pulses, Mirrors, Phase-unifying mirrors, Silica, Xenon
Abstract

A study was performed on phase-unifying mirrors for high-power XeF excimer lasers. The beam quality factor was measured to further characterize the XeF laser beam. It was found that the beam angular stability was of 0.009 and of 0.004 mrad along x and y, respectively.

Notes

cited By 4

URLhttps://www.scopus.com/inward/record.uri?eid=2-s2.0-0037464255&doi=10.1063%2f1.1562345&partnerID=40&md5=e3c9fb08da49ff33656105f4ca36fff7
DOI10.1063/1.1562345
Citation KeyDeTomasi20031809