| Title | XPS investigation on amorphous silion nitride (a‐SiNx) chemical structure |
|---|---|
| Publication Type | Articolo su Rivista peer-reviewed |
| Year of Publication | 1988 |
| Authors | Ingo, G.M., Zacchetti N., Della Sala Dario, and Coluzza C. |
| Journal | Surface and Interface Analysis |
| Volume | 12 |
| Pagination | 323-324 |
| ISSN | 01422421 |
| Keywords | chemical structure, Dual ion beam sputtering, electron, Extended Abstract, Films–Structure, Ion beams, Nitrogen-induced Chemical Shift, Silicon Nitride, Spectroscopy, Sputtering, X-ray Photoelectron Spectroscopy |
| Notes | cited By 2 |
| URL | https://www.scopus.com/inward/record.uri?eid=2-s2.0-0024035829&doi=10.1002%2fsia.740120511&partnerID=40&md5=0bc29c9b2ae79c79530771a3a73220a3 |
| DOI | 10.1002/sia.740120511 |
| Citation Key | Ingo1988323 |
