| Title | Deposition of SiO2 films with high laser damage thresholds by ion-assisted electron-beam evaporation |
|---|---|
| Publication Type | Articolo su Rivista peer-reviewed |
| Year of Publication | 1999 |
| Authors | Alvisi, Marco, De Nunzio G., Di Giulio M., Ferrara Maria Cristina, Perrone M.R., Protopapa Maria Lucia, and Vasanelli L. |
| Journal | Applied Optics |
| Volume | 38 |
| Pagination | 1237-1243 |
| ISSN | 00036935 |
| Abstract | SiO2 thin films (≈100 nm thick) with transmittivity and a laser damage threshold nearly equal to those of bulk material are deposited on silica substrates by the technique of ion-assisted electron-beam evaporation. The influence of film packing density on the laser damage threshold is investigated by the technique of photoacoustic probe beam deflection. It is shown that films with lower packing density may have a higher laser damage threshold and as a consequence better heat dissipation. © 1999 Optical Society of America. |
| Notes | cited By 18 |
| URL | https://www.scopus.com/inward/record.uri?eid=2-s2.0-0002941993&partnerID=40&md5=75305fb544806475dadcd649c39f31b1 |
| Citation Key | Alvisi19991237 |
