The numerical and experimental analysis of laser back-scribing fabrication of a-Si photovoltaic cells, made out of a multilayer thin film on a glass substrate, is carried out. The numerical study is performed by means of a rather simple combined optical and thermal model. Experiments are carried out throughout the three phases of the manufacturing process. The successive targets of the selective cut are a transparent conductive oxide thin film (TCO), a TCO/a-Si double layer and a TCO/a-Si/Al multilayer. Experimental results and predictions from the numerical model are compared in terms of the cut energy flux values. In the numerical study the cut energy flux is assumed to be the one which determines the melting of the material. The predicted cut energy fluxes are in good agreement with experimental results.

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